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Examining the Properties of Rare-Earth Ditelluride Thin Films

This article highlights the behavior of rare-earth ditellurides in thin film applications.

― 5 min read


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Table of Contents

Rare-earth ditelluride thin films are materials that have special properties and can be used in different applications. This article discusses how these materials behave when they are made in very thin layers on a special surface called MgO. We will look at how these films are created, their structure, and how they can change their properties based on different conditions.

What are Rare-Earth Ditellurides?

Rare-earth ditellurides are compounds that contain rare-earth elements and tellurium. These materials are known for showing various electronic behaviors, such as superconductivity and charge-density-wave ordering. Charge-density-wave ordering is when the electrons in a material align in a specific pattern, leading to interesting Electronic Properties.

Making Thin Films of DyTe

To create thin films of DyTe, a type of rare-earth ditelluride, a method called molecular beam epitaxy is used. In this process, atoms are deposited layer by layer onto a surface. Here, an atomically flat MgO surface is used as the base. When DyTe is deposited, it forms a single phase, meaning that the material is uniform and consistent throughout. Techniques like transmission electron microscopy and X-ray diffraction are used to check the quality and orientation of the films.

As the films grow thicker, they experience a change in strain, which is the change in shape caused by external forces. This strain is relieved as the film thickness increases. When the film reaches a thickness of about 20 unit cells, a supercell forms, which is a larger structure made from the arrangement of the tellurium atoms. This supercell formation is linked to a deficiency of tellurium in the layers.

Electronic Properties and First Principles Calculations

The changes in the arrangement of atoms lead to different electronic properties. First principles calculations, a type of theoretical approach, suggest that the formation of the Defect Lattice, which is an irregular arrangement of atoms, occurs due to certain conditions on the Fermi surface. The Fermi surface is an important concept in solid-state physics that describes the energies of electrons in a material.

Through these calculations, it is observed that the periodic arrangement of tellurium vacancies influences the electronic structure and leads to the opening of a band gap, which means that the material can behave like a semiconductor.

Layered Structures and Their Significance

The arrangement of atoms in layered materials like DyTe has a big impact on their electronic properties. Rare-earth tellurides can display various electronic phases. For instance, they may show superconductivity, topological protected modes, magnetism, or charge-density-wave ordering.

Because of this, it's important to understand how different factors like the type of rare-earth element, vacancy structures, and the conditions under which they are made can affect these properties. Changing the rare-earth element can create different chemical pressures, which can further influence the electronic properties of the material.

Challenges with Growth Conditions

While it is known that rare-earth tritellurides can be stable, the ditellurides tend to have more complex structures because they can form with different amounts of tellurium. This can lead to a variety of structural modulations based on how much tellurium is available during growth. Unlike tritellurides, ditellurides have a wider range of stoichiometry, meaning they can take many forms based on the number of tellurium atoms present.

These variations can lead to different electrical properties, ranging from metallic to semiconducting behavior. For example, some forms of CeTe may become superconducting under pressure, highlighting the relationship between structural arrangement and electronic behavior.

Characterization Techniques

To study the structural properties of DyTe films, a range of techniques are employed. X-ray diffraction helps to analyze how the atoms are arranged in the films, confirming their quality and the presence of defects. Atomic force microscopy is used to study the surface roughness of the films.

The presence of a superlattice, which is a repeating pattern of atomic arrangement, can be observed in specific films. These characteristics are important as they directly relate to the electronic properties of the material.

Growth Process Overview

The growth process of DyTe thin films begins with preparing the substrate by heating it to very high temperatures to create a smooth surface. Once the surface is prepared, the Dy and Te atoms are deposited layer by layer. It’s crucial to control the temperature and the amount of each atom being deposited to achieve high-quality films.

During the growth, the reflection high-energy electron diffraction (RHEED) technique is used to monitor the growth rate and to ensure the layers are being added correctly. Images taken at different stages of growth show how the surface transitions from a rough structure to a smooth and well-defined one.

Structural Properties and Strain Effects

The films display interesting structural characteristics. The compressive strain present in the films changes as they grow thicker. This strain can influence the electronic properties, as the arrangement of atoms may adjust, leading to different electronic behaviors. An examination of the diffraction patterns reveals a unique supercell structure that is stabilized in the films.

Understanding the Defect Lattice

A special focus is given to how the defect lattice-resulting from the vacancies in the tellurium layers-affects the material's properties. The nature of these defects and how they interact with the electronic structure of the film is an area of active research.

By performing calculations that model different configurations of atom arrangements, researchers can predict how variations in tellurium content and arrangement can lead to changes in electrical behavior, potentially leading to new applications in electronics.

Conclusion

The growth of DyTe films on MgO substrates reveals a lot about the complex behaviors of rare-earth ditellurides. The relationship between strain, defect structures, and electronic properties is a key area of interest, as it opens up possibilities for potential applications in future electronic devices. The ability to control these factors during growth presents an exciting opportunity for advancing the understanding and manipulation of material properties.

Through a combination of growth techniques, structural analysis, and theoretical calculations, the study of these materials continues to evolve, paving the way for new discoveries in condensed matter physics and materials science.

Original Source

Title: Supercell formation in epitaxial rare-earth ditelluride thin films

Abstract: Square net tellurides host an array of electronic ground states and commonly exhibit charge-density-wave ordering. Here we report the epitaxy of DyTe$_{2-\delta}$ on atomically flat MgO (001) using molecular beam epitaxy. The films are single phase and highly oriented as evidenced by transmission electron microscopy and X-ray diffraction measurements. Epitaxial strain is evident in films and is relieved as the thickness increases up to a value of approximately 20 unit cells. Diffraction features associated with a supercell in the films are resolved which is coupled with Te-deficiency. First principles calculations attribute the formation of this defect lattice to nesting conditions in the Fermi surface, which produce a periodic occupancy of the conducting Te square-net, and opens a band gap at the chemical potential. This work establishes the groundwork for exploring the role of strain in tuning electronic and structural phases of epitaxial square-net tellurides and related compounds.

Authors: Adrian Llanos, Salva Salmani-Rezaie, Jinwoong Kim, Nicholas Kioussis, David A. Muller, Joseph Falson

Last Update: 2023-08-27 00:00:00

Language: English

Source URL: https://arxiv.org/abs/2308.14159

Source PDF: https://arxiv.org/pdf/2308.14159

Licence: https://creativecommons.org/licenses/by/4.0/

Changes: This summary was created with assistance from AI and may have inaccuracies. For accurate information, please refer to the original source documents linked here.

Thank you to arxiv for use of its open access interoperability.

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